Metal Compound Chemically Anchored Colloidal Particles and Methods of Production and Use Thereof

ABSTRACT

Metal compound chemically anchored colloidal particles wherein the metal compound is in molecular form are disclosed. A facile and fast process to chemically anchor metal compounds uniformly onto colloidal particle surfaces via chemical bonding has been developed. Metal compounds are chemically anchored to the surface of colloidal particles via an organic linking agent. Uniformly distributed metal compounds remain in molecular form after the process. The metal compound chemically anchored colloidal particles can be used as solid catalyst in metal chemical-mechanical planarization process.

This Application is a divisional application of U.S. application Ser.No. 15/070,590, filed on Mar. 15, 2016, which claims the benefit of U.S.Provisional Application No. 62/136,706, filed on Mar. 23, 2015. Thedisclosures of the Applications are hereby incorporated by reference.

BACKGROUND OF THE INVENTION

This invention relates generally to metal compound chemically anchoredcolloidal particles, the methods of production and use thereof.

The metal compound chemically anchored colloidal particles, morespecifically, are colloidal particles having metal compounds uniformlyanchored to the surfaces via chemical bonding. The metal compounds arein molecular form. The metal compound chemically anchored colloidalparticles can be widely used in the industry, for example, to act ascatalyst to increase the reaction rates for a range of differentprocesses. For example, they can be used as a solid catalyst inchemical-mechanical planarization (CMP) of semiconductor wafers.

There are a large number of materials used in the manufacture ofintegrated circuits such as a semiconductor wafer. The materialsgenerally fall into three categories—dielectric material, adhesionand/or barrier layers, and conductive layers. The use of the varioussubstrates, e.g., dielectric material such as TEOS, plasma-enhanced TEOS(PETEOS), and low-k dielectric materials; barrier/adhesion layers suchas tan copper, tantalum, titanium, tantalum nitride, and titaniumnitride; and conductive layers such as aluminum, tungsten, and noblemetals are known in the industry.

Integrated circuits are interconnected through the use of well-knownmultilevel interconnections. Interconnection structures normally have afirst layer of metallization, an interconnection layer, a second levelof metallization, and typically third and subsequent levels ofmetallization. Interlevel dielectric materials such as silicon dioxideand sometimes low-k materials are used to electrically isolate thedifferent levels of metallization in a silicon substrate or well. Theelectrical connections between different interconnection levels are madethrough the use of metallized vias and in particular tungsten vias. U.S.Pat. No. 4,789,648 describes a method for preparing multiple metallizedlayers and metallized vias in insulator films. In a similar manner,metal contacts are used to form electrical connections betweeninterconnection levels and devices formed in a well. The metal vias andcontacts are generally filled with tungsten and generally employ anadhesion layer such as titanium nitride (TiN) and/or titanium to adherea metal layer such as a tungsten metal layer to the dielectric material.

W (tungsten) has been a widely used material for the formation ofcontact, via and hole for connecting the inter-layer metal lines in ICfabrication due to its excellence in filling vias by Chemical VaporDeposition (CVD).

In a typical process, via holes are etched through the interleveldielectric (ILD) to interconnection lines or to a semiconductorsubstrate. Next, a thin adhesion layer such as titanium nitride and/ortitanium is generally formed over the ILD and is directed into theetched via hole. Then, a tungsten film is blanket deposited over theadhesion layer and into the via. The deposition is continued until thevia hole is filled with tungsten. Finally, the excess tungsten isremoved by chemical mechanical polishing (CMP) to form contacts andvias.

In a typical CMP process, a substrate (e.g., a wafer) is placed incontact with a rotating polishing pad attached to a platen. A CMPslurry, typically an abrasive and chemically reactive mixture, issupplied to the pad during CMP processing of the substrate. During theCMP process, the pad (fixed to the platen) and substrate are rotatedwhile a wafer carrier system or polishing head applies pressure(downward force) against the substrate. The slurry accomplishes theplanarization (polishing) process by chemically and mechanicallyinteracting with the substrate film being planarized due to the effectof the rotational movement of the pad parallel to the substrate.Polishing is continued in this manner until the desired film on thesubstrate is removed with the usual objective being to effectivelyplanarize the substrate. Typically metal CMP slurries contain anabrasive material, such as silica or alumina, suspended in an oxidizing,aqueous medium.

The ratio of the removal rate of a metal (e.g., tungsten) to the removalrate of a dielectric base is called the “selectivity” for removal of themetal in relation to removal of the dielectric during CMP processing ofsubstrates comprised of metal and dielectric material.

When CMP slurries with high selectivity for removal of metal in relationto dielectric are used, the metal layers are easily over-polishedcreating a depression or “dishing” effect in the metalized areas. Thisfeature distortion is unacceptable due to lithographic and otherconstraints in semiconductor manufacturing.

Another feature distortion that is unsuitable for semiconductormanufacturing is called “erosion.” Erosion is the topography differencebetween a field of dielectric and a dense array of metal vias ortrenches. In CMP, the materials in the dense array may be removed oreroded at a faster rate than the surrounding field of dielectric. Thiscauses a topography difference between the field of dielectric and thedense metal (e.g., copper or tungsten) array.

As industry standards trend toward smaller device features, there is acontinuous developing need for tungsten CMP slurries that deliversuperior planarization of the nanostructures of IC chips. Specifically,for 28 nm technology nodes and beyond applications, slurry products mustdeliver tunable removal rate and tunable selectivity between metal anddielectric, reduce the erosion and dishing while maintaining sufficientremoval rate.

The slurry chemistry plays a major role in removing the W material byCMP process. The W slurry should consist of suitable abrasives withappropriate chemicals to meet the requirements. Usually an oxidizer isadded to W slurry since it plays a key role in increasing the removalrate by forming the passive tungsten oxide layer, which is softer than Wmaterial, onto the surface and this surface is mechanically abraded byabrasive particles.

Colloidal silica plays a key role as a polishing slurry for CMP process.Several attempts have been done in modifying these slurries to make itsuitable for the CMP process for different materials and applications.

Recently work has been performed on coating of the catalyst to theabrasive to enhance the chemical reaction between oxidizing agent andthe metal to be polished during CMP process.

U.S. Pat. No. 4,478,742 discloses a method of producing iron acetatecoated silica sol comprising the steps of passing a mixture of ion freecolloidal silica and an inorganic iron salt in contact with a strongbase anion exchange resin in the acetic acid salt form under conditionswhereby the iron salt is converted to the iron acetate and is coated onthe silica sol, thereby producing an iron acetate coated silica sol.

U.S. Pat. Nos. 7,014,669, 7,029,508 and 7,427,305 teach a compositionfor chemical mechanical polishing which comprises at least one abrasiveparticle having a surface at least partially coated by a catalyst. Thecatalyst comprises a metal other than a metal of Group 4(b), Group 5(b)or Group 6(b). The composition further comprises at least one oxidizingagent. The composition is believed to be effective by virtue of theinteraction between the catalyst coated on the surface of the abrasiveparticles and the oxidizing agent, at the catalyst surface. Theinvention further provides a method that employs the composition in thepolishing of a feature or layer, such as a metal film, on a substratesurface. The invention additionally provides a substrate produced thismethod.

Young-Jae Kang et al (J. Colloid & Inter. Sci. 2010, 349, 402-407)disclose a new method of Fe (metal) precipitation on colloidal silica toovercome the stability problem, which would be responsible in producingdefects, with commercially available fumed silica slurry containing Feions. More specifically, Young-Jae Kang et al have synthesized colloidalsilica particles using sodium silicate (Na₂SiO₃) as raw material withand without Fe precipitation by ion exchange process.

J. Colloid & Inter. Sci. 2005, 282, 11-19, studied the synthesis andcharacterization of iron oxide-coated silica. A three-level fractionalfactorial study was used to determine the optimum conditions forproducing goethite-coated silica. The amount of coating achieved wasbetween 0.59 and 21.36 mg Fe g-1 solid. The most significant factor incoating using either adsorption or precipitation was the particle sizeof silica, where Fe increased from an average of 0.85 to 9.6 mg Fe g-1solid as silica size decreased from 1.5 to 0.2 mm. Other factorsinvestigated, including coating temperature, initial iron concentration,and contact time, were of less importance. The iron oxide coatings wereobserved to be non-uniform, concentrated in rough concave areas. FTIRrevealed a band shift as well as a new band indicating changes in thechemical environment of Fe—O and Si—O bonds; these results along withabrasion studies suggest that the interaction between the oxide coatingand silica surface potentially involves chemical forces. Because thenano-sized iron oxide coatings increased surface area, introduced smallpores, and changed the surface charge distribution of silica, the coatedsystem demonstrates a greater affinity for Ni compared to that ofuncoated silica.

US2013/0068995 discloses a silica having metal ions absorbed thereon anda fabricating method thereof are provided. The silica having metal ionsabsorbed thereon is a silica having metal ions absorbed thereon andbeing modified with persulfate salt. The method includes followingsteps. A solution is provided, and the solution includes silica andpersulfate salt therein. The solution is heated to react the silica withthe persulfate salt, so as to obtain silica modified with persulfatesalt. Metal ion source is added in the solution, the metal ion sourcedissociates metal ions, and the silica modified with persulfate saltabsorbs the metal ions to obtain the silica having metal ions absorbedthereon.

There is a significant need for tungsten CMP process(es) and slurry(s)that afford low dishing and plug recess effects especially in view ofthe fact that the semiconductor industry continues to move towardssmaller and smaller feature sizes.

BRIEF SUMMARY OF THE INVENTION

Present invention discloses metal compound chemically anchored colloidalparticles, which are colloidal particles having metal compoundsuniformly anchored to surfaces of colloidal particles via chemicalbonding. The metal compounds are in molecular form. The chemical bondingbetween the particle and the metal compound may be covalent, ionic,hydrogen bonding, or through Van der Waal forces. More preferably thebonding is covalent in nature. These metal compounds bonded to theparticles may also be referred to as activator. The metal compoundchemically anchored colloidal particles can be used as novel solidcatalysts in CMP process. All the metal compounds are available for thecatalysis reaction in CMP processes since the metal compounds are inmolecular form.

In one aspect, the invention provides metal compound chemically anchoredcolloidal particles comprising:

-   -   colloidal particles;    -   metal compounds uniformly anchored on surfaces of the colloidal        particles via chemical bonding;    -   wherein the metal compounds are in molecular form.

In another aspect, the invention provides a method of making metalcompound chemically anchored colloidal particles comprising:

-   -   providing a solution comprising colloidal particles;    -   providing a soluble metal compound precursor;    -   providing an organic linking agent containing a functional group        selected from the group consisting of amine, carboxylic acid,        and combinations thereof;    -   mixing the solution comprising colloidal particles, the organic        linking agent and the soluble metal compound precursor; and    -   forming the metal compound chemically anchored colloidal        particles;    -   wherein    -   the organic linking agent modifies colloidal particle surfaces        and anchors metal compounds uniformly onto the colloidal        particle surfaces via chemical bonding to form    -   the metal compound anchored colloidal particles; and the metal        compound are in molecular form.

In yet another aspect, the invention provides a polishing compositioncomprising:

-   -   0.01-1.00 wt. % metal compound chemically anchored colloidal        particles, wherein the metal compounds are uniformly anchored on        surfaces of colloidal particles via chemical bonding and are in        molecular form;    -   0-10 wt. % abrasive;    -   0.05-10 wt. % oxidizer; and    -   liquid carrier;    -   wherein    -   pH of the composition is from about 2.0 to about 12.

In yet another aspect, the invention provides a method of chemicalmechanical polishing a semiconductor substrate having at least onesurface containing metal, comprising steps of:

-   -   a) providing the semiconductor substrate;    -   b) providing a polishing pad;    -   c) providing a polishing composition comprising        -   1) 0.01-1.00 wt. % metal compounds chemically anchored            colloidal particles, wherein the metal compounds are            uniformly anchored on surfaces of colloidal particles via            chemical bonding and are in molecular form;        -   2) 0-10 wt. % abrasive;        -   3) 0.05-10 wt. % oxidizer; and        -   4) liquid carrier;        -   wherein pH of the composition is from about 2.0 to about 12;    -   d) contacting the at least one surface containing metal with the        polishing pad and the polishing composition; and    -   e) polishing the at least one surface containing metal;        -   wherein        -   the metal is selected from the group consisting of tungsten            (W), copper (Cu), Cobalt (Co), ruthenium (Ru), tantalum            (Ta), and combinations thereof; and        -   at least a portion of the at least one surface containing            metal is in contact with both the polishing pad and the            polishing composition.

In yet another aspect, the invention provides a system for chemicalmechanical planarization of a semiconductor substrate comprising atleast one surface containing metal, the system comprising:

-   -   a polishing pad; and    -   a polishing composition comprising        -   a) 0.01-1.00 wt. % metal compounds chemically anchored            colloidal particles wherein the metal compounds are            uniformly anchored on surfaces of colloidal particles via            chemical bonding and are in molecular form;        -   b) 0-10 wt. % abrasive;        -   c) 0.05-10 wt. % oxidizer; and        -   d) liquid carrier;        -   wherein pH of the composition is from about 2.0 to about 12;    -   wherein in use of the system the at least one surface containing        metal is in contact with the polishing pad and the polishing        composition.

The colloidal particles include, but are not limited to silicaparticles, lattice doped silica particles, germania particles, aluminaparticles, lattice doped alumina particles, titania particles, zirconiumoxide particles, ceria particles, organic polymeric particles, andcombinations thereof; the size of the colloidal particles is in therange of 5-1000 nm, preferably 10-500 nm, more preferably 15-250 nm.

Metal compounds may comprise compounds of metals of Group 1(b) or Group8. The metal compound includes, but is not limited to compounds of Fe,Ru, Rh, Ir, Pt, Ag, Au, Cu, and Pd. Generally, the preferred activatorsare iron, copper, cerium, nickel, manganese, and/or cobalt. They can beused in any combination. The more preferred activators are iron orcerium salts.

The soluble metal compound precursor includes, but is not limited to ametal compound precursor containing carboxylic functional group,1-amino-ω-(hydroxyamino)alkane chelating agent, or combinations thereof.

The soluble metal compound precursor containing carboxylic functionalgroup includes, but is not limited to ammonium iron citrate, ironoxalates, iron acetates, iron tartrates, and iron complexes with variouschelating agents selected form the group consisting of nitrilo aceticacid, ethylenediamine tetraacetic acid, phosphonic acids, phosphoneacids, glycolic acid, lactic acid, malic acid, tartaric acid, or otherα-hydroxy carboxylic acid-based agents or siderophoresdihydroxyphenylalanine (DOPA); w-N-hydroxy amino acids, and combinationsthereof.

The organic linking agent includes, but is not limited to the agenthaving a general molecular structure selected from the group consistingof

-   -   and combinations thereof;    -   wherein n, m, p, q refer to the numbers of (—CH₂—) groups        between oxygen atoms connected to silicon atom and the methyl        groups and range from 1 to 12.

Specific examples of the organic linking agents include, but are notlimited to (3-Aminopropyl)triethoxysilane (APTES), octadecyl dimethylethoxysilane, (3-aminopropyl)-diethoxy-methylsilane,(3-aminopropyl)-dimethyl-ethoxysilane, (3-aminopropyl)-trimethoxysilane,Ethyl(dimethyl)ethoxysilane, 3-(Carboethoxy) propyl dimethylethoxysilane, glycidoxypropyltrialkoxysilane,isocyanatopropyltrialkoxysilane, ureidopropyltrialkoxysilane,mercaptopropyltrialkoxysilane, cyanoethyltrialkoxysilane,4,5-dihydro-1-(3-trialkoxysilylpropyl)imidazole,3-(trialkoxysilyl)-methyl ester propenoic acid,trialkoxy[3-(oxiranylalkoxy)propyl]-silane, 2-methyl,3-trialkoxysilyl)propyl ester 2-propenoic acid,[3-(trialkoxysilyl)propyl]urea,N-[(3-Trimethoxysilyl)propyl]ethylenediamine triacetic acid,trimethoxysilylpropyldiethylenetriamine and combinations hereof.

The abrasive particles includes, but is not limited to silica, alumina,titania, ceria, zirconia, diamond particles, silicon nitride particles,mono-modal, bi-modal, multi-modal colloidal particles, organicpolymer-based soft abrasives, surface-coated or modified particles, andcombinations thereof. Size of the abrasive particles as measured by anysuitable technique such as dynamic light scattering, electronmicroscopy, disc centrifuge techniques is preferably between 0.001 to1000 μm, or preferably between 0.01 to 10 μm, or most preferably between0.03 to 0.1 μm.

The oxidizer includes, but is not limited to hydrogen peroxide and otherper-oxy compounds, periodic acid, potassium iodate, potassiumpermanganate, ammonium persulfate, ammonium molybdate, ferric nitrate,nitric acid, potassium nitrate, and combinations thereof.

In another important embodiment, activator can react with a compoundthat produces free radicals. Activators can be held in a matrix suchthat the fluid containing the compounds that form free radicals contactsthe activator immediately before contacting the substrate.

Preferably, the activator can function effectively without actinicradiation. In certain embodiments the actinic radiations may be used toenhance the reaction rates

Optionally, the polishing composition further comprises one or more ofthe following:

-   -   a corrosion inhibitor;    -   a pH adjusting agent;    -   a surfactant; and    -   a biocide.

BRIEF DESCRIPTION OF SEVERAL VIEWS OF THE DRAWINGS

In the accompanying drawing forming a material part of this description,there is shown:

FIG. 1 depicts the transmission electron microscopy (TEM) images of theprepared silica particles having iron compound chemically anchored onthe surfaces.

FIG. 2 depicts the energy dispersive spectra (EDS) of the preparedsilica particles having iron compound chemically anchored on thesurfaces.

DETAILED DESCRIPTION OF THE INVENTION

Metal compound chemically anchored colloidal particles; a facile andfast process to chemically anchor metal compounds onto colloidalparticles surfaces; a CMP slurry using metal compound chemicallyanchored colloidal particles; are disclosed in present invention.

Metal compounds are chemically linked to the surfaces of colloidalparticles via an organic linking agent. Metal compounds remain inmolecular form after the process. The invented process herein yields theuniform anchoring of metal compounds on the surfaces of colloidalparticles.

When those metal compound chemically anchored colloidal particles areused in CMP slurry, all the metal compounds chemically anchoredcolloidal particles will be available for the catalysis reaction in aCMP process.

The colloidal particles include, but are limited to silica particles,lattice doped silica particles, germania particles, alumina particles,lattice doped alumina particles, titania particles, zirconium oxideparticles, ceria particles, organic polymeric particles, andcombinations thereof.

The organic polymeric particles include, but are not limited tocarboxylic acid polymers such as those derived from monomers likeacrylic acid, oligomeric acrylic acid, methacrylic acid, crotonic acidand vinyl acetic acid. Molecular weight of these polymers may be from20000 to 10000000.

The colloidal particles can have various sizes. The size of colloidalparticles ranges between 5-1000 nm, preferably 10-500 nm, mostpreferably 15-250 nm for CMP application. The colloidal particles canhave various kinds of shapes, such as sphereical, cocoon, cubic,rectangular, aggregate, tec.

A colloidal particle solution contains 0.01 to 30 wt. % of colloidalparticles. The remaining is solvent, such as distilled water, anddeionized (DI) water.

Metal compounds may comprise compounds of transition metals like copper,manganese, cobalt, and cerium, as well as the more traditional iron andcopper. In one important embodiment, metal-containing compound is havingthe metal other than a metal of Group 4(b), Group 5(b) or Group 6(b) ofthe Periodic Table of Elements. In one embodiment, compounds of metalsof Group 1(b) or Group 8 are preferred metal-containing compounds.

The metal compound includes, but is not limited to compounds of Fe, Ru,Rh, Ir, Pt, Ag, Au, Cu, and Pd. Generally, the preferred activators areiron, copper, cerium, nickel, manganese, and/or cobalt. They can be usedin any combination. The more preferred activators are iron or ceriumsalts.

The metal compound precursor is water soluble. The water soluble metalcompound precursor includes, but is not limited to a soluble metalcompound precursor containing carboxylic functional group,1-amino-ω-(hydroxyamino)alkane chelating agent, or combinations thereof.

The soluble metal compound precursor containing carboxylic functionalgroup includes, but is not limited to ammonium iron citrate, ironoxalates, iron acetates, iron tartrates, and iron complexes with variouschelating agents selected form the group consisting of nitrilo aceticacid, ethylenediamine tetraacetic acid, phosphonic acids, phosphoneacids, glycolic acid, lactic acid, malic acid, tartaric acid, or otherα-hydroxy carboxylic acid-based agents, siderophoresdihydroxyphenylalanine (DOPA); w-N-hydroxy amino acids, and combinationsthereof.

An organic linking agent chemically modifies colloidal particlesurfaces, and still maintains suitable functional groups on the surfaceof modified particles to further allow the anchoring of water solublemetal compounds onto the particle surfaces to obtain immobilized metalcompounds. The metal compounds are chemically linked to the surface ofcolloidal particles. Metal compounds remain in molecular form after theprocess. Thus, the immobilized metal compounds are homogeneouslydistributed on the surfaces of colloidal particles. All thoseimmobilized metal compounds are acting as solid state catalyst.

An organic linking agent includes but is not limited to organic silanecompounds containing amine and/or carboxylic acid functional groups.

One of the suitable organic silane compounds containing amine has thegeneral molecular structure as shown below:

Where n, m, p, q refer to the numbers of (—CH₂—) groups between oxygenatoms connected to silicon atom and the methyl groups, and betweenoxygen atom and amine group. These n, m, p, q numbers are ranged from 1to 12 independently.

These methylene group numbers can have the following possiblecombinations:

-   -   1. While all the numbers are equal, n=m=p=q;    -   2. While with three numbers are same, but one number is        different from other three numbers, such as n=m=p≠q; n=m=q≠p;        n=p=q≠m; and m=p=q≠n.    -   3. Or more optionally, there are two methylene (—CH₂—) units        that are the same, and other two methylene unit numbers are the        same.    -   4. Or more optionally, all these four methylene group units can        have all different numbers from each other, e.g. n≠m≠p≠q.

There are also other methylene group linkage unit length combinationsthat can be linked onto colloidal particle surfaces through chemicalcoupling reactions, which allow more wide range selections on theorganic silane compounds.

Example includes but is not limited to (3-aminopropyl)triethoxysilane(APTES), octadecyl dimethyl ethoxysilane,(3-aminopropyl)-diethoxy-methylsilane,(3-aminopropyl)-dimethyl-ethoxysilane, (3-aminopropyl)-trimethoxysilane,Ethyl(dimethyl)ethoxysilane, 3-(carboethoxy) propyl dimethylethoxysilane.

Another type of organic silane containing carboxylic acid has thegeneral molecular structure as shown below:

As indicated earlier, n, m, p, q numbers represent the numbers ofmethylene groups (—CH₂—) between oxygen atoms connected to silicon atomand the methyl groups and between oxygen atom and carboxylic acid group.These n, m, p, q numbers are ranged from 1 to 12 independently.

The combinations of these methylene group numbers have been describedabove.

Example includes but is not limited to glycidoxypropyltrialkoxysilane,isocyanatopropyltrialkoxysilane, ureidopropyltrialkoxysilane,mercaptopropyltrialkoxysilane, cyanoethyltrialkoxysilane,4,5-dihydro-1-(3-trialkoxysilylpropyl)imidazole,3-(trialkoxysilyl)-methyl ester propenoic acid,trialkoxy[3-(oxiranylalkoxy)propyl]-silane, 2-methyl,3-trialkoxysilyl)propyl ester 2-propenoic acid,[3-(trialkoxysilyl)propyl]urea,N-[(3-Trimethoxysilyl)propyl]ethylenediamine triacetic acid,trimethoxysilylpropyldiethylenetriamine and combinations thereof.

Both amine and carboxylic acid functional groups can be linked ontocolloidal particle surfaces through chemical coupling reactions. Amineand carboxylic acid functional groups on the chemical modified colloidalparticle surfaces can then be used to directly anchor the homogeneousmetal complex salt and convert them into the immobilized metal compoundswhich can be used as solid state catalyst.

The weight % ratio of the metal compound precursor to the colloidalparticles ranges from 0.001 to 3; and molar ratio of the organic linkingagent to the metal compound precursor is 0.001 to 10.

In one embodiment, various sized colloidal silica particles and ironcompounds are used for the preparation of iron compound chemicallyanchored colloidal silica particles. The process of chemically anchoringmetal compounds from a metal compound precursor onto colloidal particlessurfaces is developed via an organic linking agent.

For instance, chemically anchoring iron compounds from ammonium ironcitrate (iron compound precursor) onto colloidal silica particlessurfaces is developed via 3-Aminopropyl) triethoxysilane(APTES) (anorganic linking agent).

In this production process, APTES link to, and thus modify the colloidalsilica particles through the coupling reactions of Si (silane in APTES)with O (oxygen on the surfaces of colloidal silica particles), APTESstill maintain suitable functional amine groups on the surfaces ofmodified silica particles to further allow the reactions of anchoringwater soluble iron compounds chemically onto the surfaces of colloidalsilica particles to obtain the immobilized iron compounds.

Iron compounds remain in molecular form after the process. The processthus yield uniformly and chemically anchored iron compounds on thesurfaces of colloidal silica particles. Please note that all irons willbe available for the catalysis reaction in CMP process.

In the production process, colloidal (e.g. silica) particles, theorganic linking agent (e.g. (3-Aminopropyl) triethoxysilane) (APTES) andthe iron compound (e.g. ammonium iron citrate) can be mixed togetherunder a temperature ranging from 16° C. to 100° C.

The mixing sequences can be in any orders/combinations. Such as, ironcompound (e.g. ammonium iron citrate) can be mixed with organic linkingagent (e.g. (3-Aminopropyl) triethoxysilane) (APTES) first. And thencolloidal (e.g. silica) particles can be added to the mixture. Or, anorganic linking agent (e.g. (3-Aminopropyl) triethoxysilane) (APTES) canbe mixed with colloidal (e.g. silica) particles first. And then ironcompound (e.g. ammonium iron citrate) can be added to the mixture.

Chemical structures of the starting and ending materials of theproduction process can be illustrated in scheme 1 as shown below.

The product or ending material of the process is iron compoundchemically anchored colloidal silica particles.

In some embodiments the metal compounds chemically anchored to theparticle surfaces may be used as heterogeneous catalysts in variety ofapplications such as but not limited to water phase oxidation, Fentonreaction catalysis, semiconductor photocatalysis, heterogeneouscatalytic sonolysis, various hydrogenating processes, denitrificationprocess, hydrodearomatization, hydrodesulfurization and organicsynthesis reactions. Some of these applications have been described byKari Pirkaanniemi and Mika Sillanpaa (Chemosphere 48 (2002) 1047-1060)and by Ingmar Bauer and Hans-Joachim Knolker (Chemical Reviews 115(2015) 3170-3387).

In another embodiment, CMP polishing slurry (or composition) forpolishing semiconductor substrate containing metals including but notbeing limited to tungsten (W), copper (Cu), Cobalt (Co), ruthenium (Ru),tantalum (Ta), and combinations thereof, using the metal compoundchemically anchored colloidal particles as the solid catalyst can beprepared.

Anchoring or attaching metal compounds (such as iron catalyst)chemically to colloidal particles (such as silica particles) surface inmolecular form is the most efficient way to utilize them as the catalystin CMP slurry. Firstly, all metal atoms (active sites for catalyticreaction) are readily-accessible for solution species. Secondly, duringpolishing, chemical reaction is happing between oxidizer, metalsubstrate in the presence of catalyst. The closer of the catalyst to themetal substrate, the more efficient the catalyst is. For example, ifmetal exists in particle form, only the metal atoms on the surface ofthe particle are able to behave as catalytic sites. If metal molecule isnot attached on the surface of colloidal particle, some or most of metalactive sites are far away from the surface of the metal substrate duringreaction and not contributing to the chemical reaction (hydroxyl radicalformed has certain life time and will re-combine unless reaching andreacting with metal substrate). Thus, by attaching metal compound ontosilica particle surface, much lower concentration of metal can be addedinto slurry while still achieving high metal RR, which will potentiallytranslate to lower metal contamination after polishing.

Anchoring metal compound onto colloidal particle surfaces chemicallyalso eliminates common problems when using soluble metalcompound-stability over pH range. Metal compound normally is sensitiveto pH and will lose the stability out of certain pH range. Anchoringsoluble metal compound onto particle surface chemically overcomes thisproblem and give a much wider pH range with good stability.

The CMP polishing slurry or composition in the present inventioncomprises of metal compound chemically anchored on colloidal particles,nano-sized abrasive, oxidizer, corrosion inhibitor, and remaining issubstantially liquid carrier.

The metal compound chemically anchored on colloidal particles describedin present invention can be used as the solid state form of catalysts inCMP processes.

The CMP slurry contains metal compound chemically anchored on colloidalparticles ranging 0.01 wt. % to 10 wt. %; preferably ranging from 0.1wt. % to 0.5 wt. %.

Nano-sized abrasive particles used for the CMP polishing slurriesinclude, but are not limited to, silica, alumina, titania, ceria,zirconia, nano-sized diamond particles, nano-sized silicon nitrideparticles, mono-modal, bi-modal, multi-modal colloidal abrasiveparticles, organic polymer-based soft abrasives, surface-coated ormodified abrasives, and combinations thereof. Silica can be colloidalsilica with narrow or broad particle size distributions, with varioussizes and with various shapes, the various shapes of the abrasivesinclude spherical shape, cocoon shape, aggregate shape and other shapes,the colloidal silica particles doped by other metal oxide within latticeof the colloidal silica, such as alumina doped silica particles. Aluminacan be colloidal aluminum oxide, which include alpha-, beta-, andgamma-types of aluminum oxides. Titania can be colloidal and photoactivetitanium dioxide. Ceria can be cerium oxide, or colloidal cerium oxide.Zirconia can be zirconium oxide.

The CMP polishing slurries contain 0.01 wt. % to 30 wt. % abrasives;preferably, the from 0.5 wt. % to 5 wt. %.

Oxidizers used for the disclosed tungsten CMP slurries include, but arenot limited to, hydrogen peroxide and other per-oxy compounds, periodicacid, potassium iodate, potassium permanganate, ammonium persulfate,ammonium molybdate, ferric nitrate, nitric acid, potassium nitrate, andcombinations thereof. The preferred oxidizer is hydrogen peroxide.

The CMP slurry of this invention contains 0.1 wt. % to 10 wt. % of anoxidizer; the preferably from 1 wt. % to 4 wt. %, and most preferablyfrom 2 wt. % to 3 wt. %.

The corrosion inhibitor includes, but is not limited to: potassiumcyanate, polyethylenimine, and other organic polymeric or oligomericprimary and secondary amines.

The CMP slurry contains corrosion inhibitors ranging from 0.0001 wt. %to 2 wt. %, preferably ranging 0.0001 wt. % to 0.25 wt. %; morepreferably ranging from 0.0003 wt. % to 0.01 wt. %.

The liquid carrier which provides the principle portion of the liquidcomponent can be water or mixtures of water with other liquids that aremiscible with water.

Advantageously the solvent is water, such as DI water.

The chemical mechanical polishing (CMP) slurry can further comprise oneor more of the following:

-   -   a corrosion inhibitor    -   a pH adjusting agent;    -   a surfactant;    -   and    -   a biocide.

The corrosion inhibitor includes, but is not limited to potassiumcyanate, polyethylenimine, other organic polymeric or oligomeric primaryand secondary amines; and combinations thereof.

The CMP slurry of this invention contains 0.0001 wt. % to 2 wt. %;preferably 0.0001 wt. % to 0.25 wt. %; corrosion inhibitor.

pH adjusting agents used for the CMP slurry include, but are not limitedto, acids such as nitric acid, inorganic or organic acids, andcombinations thereof; bases such as sodium hydroxide, potassiumhydroxide, ammonium hydroxide, inorganic base or organic bases Thepreferred pH adjusting agent is nitric acid and potassium hydroxide.

The CMP slurry of this invention contains 0.01 wt. % to 0.5 wt. % pHadjusting agents; preferably from 0.05 wt. % to 0.15 wt. %.

The surfactants used for the disclosed tungsten CMP slurries include,but are not limited to the following

(a). Non-Ionic Surface Wetting Agents

These agents typically are oxygen- or nitrogen-containing compounds withvarious hydrophobic and hydrophilic moieties in the same molecules, themolecular weight ranges from several hundreds to over 1 million. Theviscosities of these materials also possess a very broad distribution.

(b). Anionic Surface Wetting Agents

These compounds possess the negative net charge on major part ofmolecular frame, these compound include, but not limited to thefollowing salts with suitable hydrophobic tails, such as alkylcarboxylate, alkyl sulfate, alkyl phosphate, alkyl bicarboxylate, alkylbisulfate, alkyl biphosphate, such as alkoxy carboxylate, alkoxysulfate, alkoxy phosphate, alkoxy bicarboxylate, alkoxy bisulfate,alkoxy biphosphate, such as substituted aryl carboxylate, substitutedaryl sulfate, substituted aryl phosphate, substituted arylbicarboxylate, substituted aryl bisulfate, substituted aryl biphosphateetc. The counter ions for this type of surface wetting agents include,but not limited to the following ions, such as potassium, ammonium andother positive ions. The molecular weights of these anionic surfacewetting agents range from several hundred to several hundred-thousands.

(c). Cationic Surface Wetting Agents

These cationic surface wetting agents possess the positive charge onmajor frame part of the molecular frame. The cationic surfactantsinclude, but are not limited to benzalkonium chloride, benzethoniumchloride, bronidox, cetrimonium bromide, cetrimonium chloride,distearyldimethylammonium chloride, lauryl methyl gluceth-10hydroxypropyl diammonium chloride, olaflur, tetraalkyl ammoniumchlodride, tetraalkylammonium hydroxide, and combinations thereof.

(d). Ampholytic Surface Wetting Agents

These compounds possess both of positive and negative charges on themain molecular chains and with their relative counter ions. The examplesof such bipolar surface wetting agents include, but not limited to thesalts of amino-carboxylic acids, amino-phosphoric acid, andamino-sulfonic acid.

The surfactants used in the tungsten CMP slurries range from 0.0001% to0.50%; preferably range from 0.0005% to 0.10%.

The biocides used for the disclosed tungsten CMP slurries include, butare not limited to those commercial available biocide products, such asKathon, Kathon II and others.

The biocides used in the tungsten CMP slurries ranging from 0.0001% to0.1%; preferably ranging from 0.0005% to 0.010.

For a CMP slurry, removable rate (RR) (A/min.) and Within Wafernon-uniformity % (WIWNU %) are used to measure the performance of theslurry. An increased RR and reduced WIWNU % are indications of betterperformance of a slurry.

Removal Rate (RR) is the average amount of material removed in a giventime, typically calculated over a great number of points:

${RR} = \frac{\begin{matrix}{\sum{\left( {{Pre}\text{-}{polish}\mspace{14mu} {thickness}\text{-}{Post}\text{-}{polish}\mspace{14mu} {thickness}} \right)/}} \\{\# \mspace{14mu} {of}\mspace{14mu} {points}}\end{matrix}}{{Time}\mspace{14mu} {of}\mspace{14mu} {polishing}}$

In addition, the removal rate on polishing dielectric films is notaffected while the tungsten film removal rate is boosted. Thus, theselectivity of polishing tungsten/dielectric (W/D) films can beincreased to afford tungsten CMP polishing slurries with higherselectivity of polishing W/D films.

The present invention is further demonstrated by the examples below.

Working Example

The associated methods described herein entail use of the aforementionedslurry for chemical mechanical planarization of substrates comprised oftungsten.

In production process, iron compound chemically anchored colloidalsilica particles are synthesized.

In CMP processes, the polishing slurry and associated methods describedherein are effective for CMP of a wide variety of substrates, includingmost of substrates having surfaces containing metal selected from thegroup consisting of tungsten (W), copper (Cu), Cobalt (Co), ruthenium(Ru), tantalum (Ta), and combinations thereof.

In the working examples, a substrate containing tungsten (e.g., a waferwith W surface) is placed face-down on a polishing pad which is fixedlyattached to a rotatable platen of a CMP polisher. In this manner, thesubstrate to be polished and planarized is placed in direct contact withthe polishing pad. A wafer carrier system or polishing head is used tohold the substrate in place and to apply a downward pressure against thebackside of the substrate during CMP processing while the platen and thesubstrate are rotated. The polishing slurry (composition) is applied(usually continuously) on the pad during CMP processing to effect theremoval of material to planarize the substrate.

General Experimental Procedure

In the examples presented below, CMP experiments were run using theprocedures and experimental conditions given below.

The CMP tool that was used in the examples is a Mirra®, manufactured byApplied Materials, 3050 Boweres Avenue, Santa Clara, Calif., 95054. AnIC-1010 pad, supplied by Dow Chemicals, was used on the platen for theblanket wafer polishing studies. Pads were broken-in by polishingtwenty-five dummy oxide (deposited by plasma enhanced CVD from a TEOSprecursor, PETEOS) wafers.

In order to qualify the tool settings and the pad break-in, two PETEOSmonitors were polished with Syton® OX-K colloidal silica, supplied byPlanarization Platform of Air Products Chemicals Inc. at baselineconditions. Polishing experiments were conducted using blanket W waferwith 8K Angstroms in thickness, and TEOS wafer. These blanket waferswere purchased from Silicon Valley Microelectronics, 1150 Campbell Ave,Calif., 95126

Parameters

-   Å: angstrom(s)—a unit of length-   W: tungsten-   BP: back pressure, in psi units-   CMP: chemical mechanical planarization=chemical mechanical polishing-   CS: carrier speed-   DF: Down force: pressure applied during CMP, unit psi-   min: minute(s)-   ml: milliliter(s)-   mV: millivolt(s)-   psi: pounds per square inch-   PS: platen rotational speed of polishing tool, in rpm (revolution(s)    per minute)-   SF: polishing composition flow, ml/min-   wt. %: weight percentage (of a listed component)-   TEOS: tetraethylorthosilicate-   NU % (or WIWNU %): With-In Wafer Non-Uniformity %

NU %=(1 W film thickness pre-polishing−W film thicknesspost-polishing|/mean of total W film thickness)×100%

W RR 3.0 psi: Measured tungsten removal rate at 3.0 psi down pressure ofthe CMP tool TEOS RR 3.0 psi: Measured TEOS removal rate at 3.0 psi downpressure of the CMP toolW:TEOS Selectivity: (removal rate of W)/(removal rate of TEOS) at samedown force (3.0 psi)

Iron Compound Chemically Anchored Colloidal Silica Particles

1000 ppm APTES was added to 500 g solution contained 3 wt. % silicasolution. The silica particles were 30 nm in diameter. pH of thesolution was adjusted to below 4 by adding HNO₃. The solution was heatedat 80° C. for 2 hours.

600 ppm ammonium iron citrate (˜100 ppm Fe) was added to the heatedsolution. The result solution was heated for another 2 hours.

Alternately, APTES and ammonium iron citrate were mixed first in thesolution. The solution was heated at 80° C. for 2 hours. Then silicasolution was added to the solution and continued heating for another 2hours. All chemical constitutes in the final solution were kept the sameas the first process: 3 wt. % silica, 1000 ppm APTES and 600 ppmammonium iron citrate.

Iron compound chemically anchored colloidal silica particles wereobtained.

FIG. 1 showed Transmission Electron Microscopy (TEM) images of theprepared iron compound chemically anchored colloidal silica particles.The iron compounds are anchored onto colloidal silica particles viachemical bonding.

FIG. 2 showed Energy Dispersive Spectra (EDS) of the prepared ironcompound chemically anchored colloidal silica particles.

At the first look, it seemed that only silica particles were showed inthe TEM image. Iron could not be seen from the TEM image. However, lowsignal of Fe peak in EDS confirmed the existence of iron. As discussedand illustrated in Scheme 1, iron compounds are anchored chemically tothe surface of silica particle in the form of molecular instead ofparticles. Thus, TEM results agreed well with the discussed chemicalstructure. Iron compounds could not be seen in the TEM image because oftheir molecular form. Please note that the copper peak came from the TEMgrid.

Soluble Iron Test

Soluble iron test was conducted to see if there was any soluble ironleft in the solution. The procedure was carried out as described below.

The solution was centrifuged at 13,500 RPM for 1 hour. The supernatantwas taken out. Full digestion of supernant (by mixture of H₂O₂ andsulfuric acid) was conducted by Inductively Coupled Plasma AtomicEmission Spectroscopy-(ICP-AES) to measure the iron level. The ironlevel was determined less than 1 ppm. Therefore, the results confirmedthat near 100% iron was attached to the particles.

Control Experiments

To verify the function of each components in the synthesis or productionprocess, three control experiments were performed. The results weresummarized in Table 1 below.

The results from Experiments 1 and 3 indicated that APTES served as thechemical linking agent, as discussed and illustrated in Scheme 1. APTESreacted quickly with silica oxide particle (i.e. colloidal silicaparticles) surface and formed Si—O—Si bond. In this way, silica oxideparticle surface now beard the functional group from APTES-amine group,which readily reacted with carboxylic acid group from the ironprecursor-ammonium iron citrate and chemically anchored water solubleiron compounds onto the silica oxide particle surfaces to obtain theimmobilized homogeneously distributed iron compounds.

TABLE 1 Experiments with different starting conditions. Linking Exp.particles Iron precursor agent results 1 Silica Ammonium iron APTES Ironcompound attaches to Citrate the silica 2 Silica Ammonium iron APTESMost of the iron compound sulfate remains in the solution. 3 SilicaAmmonium iron N/A Most of the iron compound Citrate remains in thesolution. 4 N/A Ammonium iron APTES Solution remains the same Citrateyellow color and no particle formed.

The results from Experiments 1 and 2 indicated that no attachment ofiron compound would happen if the iron precursor (ammonium iron sulfate)has no carboxylic acid group (e.g. sulfate group). Thus, the ironprecursor containing carboxylic acid group is vital to couple the ironprecursor with the amine group on the surfaces of the colloidal silicaparticles, and thus anchor the iron compounds chemically to thesurfaces.

Chemical Mechanical Polishing

Chemical Mechanical Polishing W substrate was carried out. Iron compoundchemically anchored colloidal silica particles were used as solidcatalyst. Three different CMP slurries were formed and used to polishingsubstrates containing W.

Standard CMP slurry without solid catalyst comprised

0.2 wt. % colloidal silica having particles size of 160 nm;

3 wt. % hydrogen peroxide;

0.27 wt. % colloidal silica which was used as base particle for solidcatalyst; and

the remaining is DI Water;

pH of the slurry is in the range of 7.0 to 8.0.

CMP slurry with solid catalyst made by the process of present inventioncomprised:

0.27 wt. % solid catalyst-iron compound chemically anchored colloidalsilica particles;

0.2 wt. % colloidal silica having particles size of 160 nm;

3 wt. % hydrogen peroxide; and

the remaining is DI Water;

wherein the colloidal silica particle has a diameter of 50 nm and pH ofthe slurry is in the range of 7.0 to 8.0.

The performances of CMP slurries with and without Iron compoundchemically anchored colloidal silica particles (solid state catalysts)were measured and compared as shown in Table 2.

TABLE 2 Comparison of polishing performance W RR Sample (Å/min) CMPslurry (with solid catalyst 6508 made by process of present invention)Standard CMP slurry (without solid 2770 catalyst)

The results in Table 2 showed that CMP slurry containing the new solidcatalyst made by the process disclosed in present invention gave a muchhigher W RR (2.35 times) compared to the standard CMP slurry withoutsolid catalyst.

The CMP slurry containing the new solid catalyst had TEOS RR at 220Å/min. Thus, the CMP slurry also offered high selectivity for removal ofW vs TEOS.

Most importantly, CMP slurry containing the new solid catalyst gave amuch lower Fe level (˜11 ppm), thus much less metal contamination on thewafer after CMP.

The results indicated that Iron compound chemically anchored colloidalsilica particles had uniform coating and higher loading of iron compoundon the base colloidal particles as solid state catalyst. Every iron atomcould be a catalysis center when they are anchored chemically to thecolloidal particles surfaces chemically.

Using iron compound chemically anchored colloidal silica particles inCMP slurry resulted in better performances, that is, high metal RR(A/min) while maintaining high selectivity for removal of metal vsdielectric material, and less metal contamination on the wafer afterCMP.

The embodiments of this invention listed above, including the workingexample, are exemplary of numerous embodiments that may be made of thisinvention. It is contemplated that numerous other configurations of theprocess may be used, and the materials used in the process may beelected from numerous materials other than those specifically disclosed.

1. A method of making metal compound chemically anchored colloidalparticles comprising: providing a solution comprising colloidalparticles; providing a soluble metal compound precursor; providing anorganic linking agent containing a functional group selected from thegroup consisting of amine, carboxylic acid, and combinations thereof;mixing the solution comprising colloidal particles, the organic linkingagent and the soluble metal compound precursor; and forming the metalcompound chemically anchored colloidal particles; wherein the organiclinking agent modifies colloidal particle surfaces and anchors metalcompounds onto the colloidal particle surfaces via chemical bonding toform the metal compound anchored colloidal particles; and the metalcompounds are in molecular form.
 2. The method of claim 1, wherein thesolution comprising colloidal particles contains 0.01 to 30 wt. % ofcolloidal particles; the colloidal particles are selected from the groupconsisting of silica particles, lattice doped silica particles, germaniaparticles, alumina particles, lattice doped alumina particles, titaniaparticles, zirconium oxide particles, ceria particles, organic polymericparticles, and combinations thereof; and size of the colloidal particlesranges between 5-1000 nm.
 3. The method of claim 1, wherein the organiclinking agent has a general molecular structure selected from the groupconsisting of

and combinations thereof; wherein n, m, p, q are the numbers ofmethylene (—CH₂—) groups, and each is independently selected from anumber from 1 to
 12. 4. The method of claim 3, wherein the organiclinking agent is selected from the group consisting of(3-Aminopropyl)triethoxysilane (APTES), octadecyl dimethyl ethoxysilane,(3-aminopropyl)-diethoxy-methylsilane,(3-aminopropyl)-dimethyl-ethoxysilane, (3-aminopropyl)-trimethoxysilane,Ethyl(dimethyl)ethoxysilane, 3-(Carboethoxy) propyl dimethylethoxysilane, glycidoxypropyltrialkoxysilane,isocyanatopropyltrialkoxysilane, ureidopropyltrialkoxysilane,mercaptopropyltrialkoxysilane, cyanoethyltrialkoxysilane,4,5-dihydro-1-(3-trialkoxysilylpropyl)imidazole,3-(trialkoxysilyl)-methyl ester propenoic acid,trialkoxy[3-(oxiranylalkoxy)propyl]-silane, 2-methyl,3-trialkoxysilyl)propyl ester 2-propenoic acid,[3-(trialkoxysilyl)propyl]urea,N-[(3-Trimethoxysilyl)propyl]ethylenediamine triacetic acid,trimethoxysilylpropyldiethylenetriamine and combinations thereof.
 5. Themethod of claim 1, wherein the soluble metal compound is selected fromthe group consisting of Fe compounds, Cu compounds, Ag compounds, Crcompounds, Mn compounds, Co compounds, Ni compounds, Ga compounds, andcombinations thereof.
 6. The method of claim 1, wherein the solublemetal compound precursor contains carboxylic functional group,1-amino-ω-(hydroxyamino)alkane chelating agent, or combinations thereof.7. The method of claim 6, wherein the soluble metal compound precursoris an iron compound precursor containing carboxylic acid functionalgroup selected from the group consisting of ammonium iron citrate; ironoxalate; iron acetate; iron tartrate; iron compound having chelatingagent selected form the group consisting of nitriloacetic acid,ethylenediamine tetraacetic acid, phosphonic acid, phosphone acid,glycolic acid, lactic acid, malic acid, tartaric acid, α-hydroxycarboxylic acid, siderophores dihydroxyphenylalanine (DOPA), ω-N-hydroxyamino acid, and combinations thereof.
 8. The method of claim 1, whereinthe solution comprising colloidal particles contains 0.01 to 30 wt. % ofcolloidal particles; and wt. % ratio of the soluble metal compoundprecursor to the colloidal particles ranges from 0.001 to
 3. 9. Themethod of claim 1, wherein the soluble metal compound precursor isammonium iron citrate, the colloidal particles are colloidal silicaparticles, the organic linking agent is (3-Aminopropyl)triethoxysilane(APTES), and the metal compound chemically anchored colloidal particlesare iron compound chemically anchored silica particles.
 10. The methodof claim 1, wherein the mixing is performed under a temperature rangingfrom 16° C. to 100° C.
 11. A polishing composition comprising: 0.01-1.00wt. % metal compound chemically anchored colloidal particles, whereinthe metal compounds are uniformly anchored on surfaces of colloidalparticles via chemical bonding and are in molecular form; 0-10 wt. %abrasive; 0.05-10 wt. % oxidizer; and liquid carrier; wherein pH of thecomposition is from about 2.0 to about
 12. 12. The polishing compositionof claim 11, wherein the metal compound is selected from the groupconsisting of tungsten (W), copper (Cu), Cobalt (Co), ruthenium (Ru),tantalum (Ta), and combinations thereof; and the colloidal particles areselected from the group consisting of silica particles, lattice dopedsilica particles, germania particles, alumina particles, lattice dopedalumina particles, titania particles, zirconium oxide particles, ceriaparticles, organic polymeric particles, and combinations thereof; andsize of colloidal particle ranges between 5-1000 nm.
 13. The polishingcomposition of claim 11, wherein the metal compound chemically anchoredcolloidal particles are iron compound chemically anchored colloidalsilica particles.
 14. The polishing composition of claim 11, wherein theabrasive is selected from the group consisting of silica, alumina,titania, ceria, zirconia, nano-sized diamond particles, nano-sizedsilicon nitride particles, mono-modal, bi-modal, multi-modal colloidalabrasive particles, organic polymer-based soft abrasives, surface-coatedor modified abrasives, and combinations thereof.
 15. The polishingcomposition of claim 11, wherein the oxidizer is selected from the groupconsisting of hydrogen peroxide and other per-oxy compounds, periodicacid, potassium iodate, potassium permanganate, ammonium persulfate,ammonium molybdate, ferric nitrate, nitric acid, potassium nitrate, andcombinations thereof.
 16. The polishing composition of claim 11, whereinthe polishing composition comprising iron compound chemically anchoredcolloidal silica particles; colloidal silica particles; hydrogenperoxide; distilled water or deionized (DI) water; and the pH rangesfrom 6-9.
 17. The polishing composition of claim 11, wherein thepolishing composition further comprises at least one selected from thegroup consisting of: 0.0001 wt. % to 2 wt. % corrosion inhibitor; 0.01wt. % to 0.5 wt. % pH adjusting agents; 0.0001 wt. % to 0.50 wt. %surfactant; and 0.0001 wt. % to 0.1 wt. % biocide.